Nanoimprint lithography (NIL) replicates 2D or 3D nanostructures with high throughput for photonics, optics and nanofluidics applications. This method relies on high-precision master templates prepared by direct-write nano- or microlithography.
High resolution patterning over large areas
Accuracy of grayscale nanolithography
Additional processing steps (e.g. etching) for the final master
High-fidelity 3D replicas from NanoFrazor patterns
A sine-wave pattern replicated in OrmoClear®FX optical polymer from a working OrmoStamp® stamp prepared by patterning a structure into the PPA resist and etching it into silicon master template. Courtesy of micro resist technology GmbH
Step-and-repeat NIL with NanoFrazor-patterned templates
Comparison between the first and the 10th imprint of an 8-level computer generated hologram. The working stamp was directly prepared from NanoFrazor patterned PPA resist. Courtesy of EV Group
Amplification of 3D patterns by etching
Computer-generated 8-level hologram patterned in PPA and etched into Si (inset). Reactive ion etching enabled depth amplification from 70 nm to 700 nm.
Replication of high-resolution features
Logos replicated in a sol-gel resist directly from nanofrazored PPA. Lines and spaces are written with 25 nm half-pitch. Courtesy of SCIL Nanoimprint Solutions
Large Area Masters
NIL is often used for replication of grayscale 3D features. Industrial applications can require masters that are seamlessly covered with 3D features over areas as big as 1 x 1 m2. Our DWL systems are used by industry to achieve this with high fidelity and high enough throughput.
Accurate grayscale lithography
down to single-nanometer accuracy.
for templates and copies.
Compatibility of resists
with various industrial NIL processes.
High write speed
to make grayscale masters even up to 1 x 1 m2.
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