As AI and HPC push monolithic circuits to obsolescence, the industry turns to Advanced Packaging. Yet, challenges like die shift and substrate warpage threaten to kill yield before the package leaves the fab. Enter the new hero of microelectronics: Maskless Lithography. Learn how adaptive alignment ensures your chiplets live to compute another day.
Heidelberg Instruments’ Workshop on Maskless Lithography and Direct Write technology in Japan, hosted at The University of Tokyo’s Takeda Building. Source: The University of Tokyo.
Get a sneak peek into current material related research and further prospects. Our webinars on our NanoFrazor Technology cover a variety of topics around its
Upfront the MNE 2022 Eurosensors Conference in Leuven, Belgium from September 19th to 23rd GenISys, Heidelberg Instruments, micro resist technology and Multiphoton Optics jointly organize the 2022 edition of
NanoFrazor technology: Enabling advanced nanodevices and unique applications register now The NanoFrazor uses thermal scanning probe lithography (t-SPL) for the simultaneous patterning and inspection of
Join us for the 3rd Nano-Micro-Lithography Symposium, hosted on gather.town. This online event brings together technical experts, customers and users from Heidelberg Instruments, micro resist
Mark your calendars! The Heidelberg Instruments short webinar series starts on Thursday, July 29th. Full details on all of the webinars can be found below.
Last month, the first nanofabPOM (Nanofabrication Photonics Online Meetup) took place. For those of you who presented or just showed up for listening, thanks for
Nanofabrication Photonics Online Meetup is a free online conference that will take place in May 16-18, 2021. Heidelberg Instruments is taking part in organizing this event
Organic substrates are hitting a wall. Discover how Heidelberg Instruments’ maskless lithography enables the glass revolution to break the sub-2 µm barrier for AI.
Heidelberg Instruments is excited to announce a follow-up order from a leading Asian manufacturer of display photomasks for its flagship VPG⁺ 1400 FPD Volume Pattern Generator.
Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor at EPFL.
Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system, developed on the established platform of its flagship VPG+ 1400 FPD Volume Pattern Generator.
As AI and HPC push monolithic circuits to obsolescence, the industry turns to Advanced Packaging. Yet, challenges like die shift and substrate warpage threaten to kill yield before the package leaves the fab. Enter the new hero of microelectronics: Maskless Lithography. Learn how adaptive alignment ensures your chiplets live to compute another day.
What a week! From September 15–18, we had the pleasure of joining the micro- and nanofabrication community at the 51st International Micro and Nano Engineering Conference (MNE 2025) in Southampton, UK.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Heidelberg Instruments Korea celebrates 20 years of customer commitment and partnership! Built on trust, loyalty, and long-term relationships, Heidelberg Instruments Korea continues to play a vital role in bringing innovation to local customers.
Join Heidelberg Instruments in Southampton for MNE 2025! We are proud to be sponsor of the prestigious Fellow Award and are looking forward to celebrate the 10th anniversary of our MLA 150 with you.
Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66⁺, solidifying its position as the ultimate research tool for microfabrication.
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