Vertical sidewalls in thick epoxy resist – a challenge for laser-based direct write lithography

Achieve straight, vertical sidewalls in thick negative-tone resist using focused laser beam-based direct write lithography, overcoming non-homogeneous illumination and non-sharp edges. (Possible application: MEMS)

File Type: 100210
Categories: Scientific Paper
Tags: Direct-writing, DWL 66
Author: Micro and Nano Engineering
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