Ultra-thick positive photoresist layers for maskless grayscale lithography

Grayscale lithography can create structured surfaces in photoresist for micro-optics applications. Experiments show promise in fabricating structures over 100 μm using a new experimental resist.

File Type: 2658355
Categories: Scientific Paper
Tags: Direct Writing, DWL 66+, Grayscale
Author: Heidelberg Instruments, SPIE. Digital Library
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