Scalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithography

Utilizing grayscale lithography and hard-mask methods, silicon carbide hosts micrometer-scale features and hemispherical solid immersion lenses, boosting optical collection for quantum emitters. Scalable, reproducible, CMOS-compatible.

File Type: 0144684
Categories: Scientific Paper
Tags: Direct-writing, DWL 66, Grayscale
Author: Applied Physics Letters
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