Scalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithography

Grayscale lithography and hard-mask techniques allow for the creation of micrometer-scale features and nearly hemispherical solid immersion lenses in silicon carbide, enhancing optical collection efficiency for quantum emitters. The technique is reproducible, scalable, and compatible with CMOS technology.

File Type: 0144684
Categories: Scientific Paper
Tags: Direct-writing, DWL 66, Grayscale
Author: Applied Physics Letters
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