Multi‐ and Gray‐Scale Thermal Lithography of Silk Fibroin as Water‐Developable Resist for Micro and Nanofabrication

This paper describes a hybrid thermal lithography method that uses silk fibroin as a water-developable resist for the fabrication of micro and nanoscale structures.

File Type: 202303518
Categories: Scientific Paper
Tags: NanoFrazor, Thermal Scanning Probe (t-SPL)
Author: Advanced Science
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