Via-hole oxidation process for forming buried oxide-confined waveguides, resulting in straight, low-loss waveguides with smooth interfaces, simplifying III-V-semiconductor-oxide photonic device fabrication.
Categories:
Scientific Paper
Via-hole oxidation process for forming buried oxide-confined waveguides, resulting in straight, low-loss waveguides with smooth interfaces, simplifying III-V-semiconductor-oxide photonic device fabrication.
Follow us on social media to benefit
from a range of useful resources.
Disclaimer: Translations were created with the help of AI. Heidelberg Instruments does not guarantee the correctness of the translations.