This work explores thermal scanning probe lithography (t-SPL) to fabricate devices with sub-50 nm features, enabling energy-efficient non-volatile computing and memory devices using 2D materials.
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Scientific Paper
This work explores thermal scanning probe lithography (t-SPL) to fabricate devices with sub-50 nm features, enabling energy-efficient non-volatile computing and memory devices using 2D materials.
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Disclaimer: Translations were created with the help of AI. Heidelberg Instruments does not guarantee the correctness of the translations.