Overview on Maskless Grayscale Lithography
From design to micro structured topography: Grayscale lithography can be used to quickly fabricate various 2.5D and 3D structures at the micro scale.
From design to micro structured topography: Grayscale lithography can be used to quickly fabricate various 2.5D and 3D structures at the micro scale.
Grayscale lithography can create structured surfaces in photoresist for micro-optics applications. Experiments show promise in fabricating structures over 100 μm using a new experimental resist.
Utilizing grayscale lithography and hard-mask methods, silicon carbide hosts micrometer-scale features and hemispherical solid immersion lenses, boosting optical collection for quantum emitters. Scalable, reproducible, CMOS-compatible.
We present the powerful software solution 3D-PEC of GenISys BEAMER for rapid and easy optimization of complex 3D microstructures fabricated with Grayscale laser lithography.
The Quantum Issue of The Lithographer, issued Fall 2020 Topics include: Maskless Aligners, Grayscale, 2D Materials, Quantum Technology
We investigate neurite guidance using semiconductor industry-compatible techniques for fabricating modulated surfaces, enabling the cultivation and study of ordered neuronal networks in a 2.5D configuration.
Inverse design enables the creation of thin, high-NA flat lenses. Multi-level diffractive lens (MDL) with a NA=0.9 at 850 nm wavelength, replicable via imprint lithography.
The Rise of Grayscale Lithography: Direct-write 3D patterning scaled from µm to nm. Grayscale Lithography Issue of The Lithographer, issued January 2020.
Multi-level diffractive lens (MDL) designs drastically enhance depth of focus by over 4 orders of magnitude, enabling focus maintenance for objects separated by large distances.
With the control of the phase in the image plane, a single diffractive surface can correct chromatic aberrations over a wide bandwidth, simplifying imaging systems.
September 1, 2023, Espoo, Finland – Lumineq Oy, a global leader in transparent display technology, has announced a strategic investment
The EIPBN conference, which stands for the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, and is
We are thrilled to announce the results of our recent image competition, which showcased the capabilities of our tools in
Get a sneak peek into current material related research and further prospects. Our webinars on our NanoFrazor® Technology cover a
Heidelberg, Germany – Heidelberg Instruments, a global player in direct write technology and solution provider for the advanced packaging market,
Successful 7th Edition of the Thermal Probe Workshop hosted by Heidelberg Instruments Nano After a break of more than three
IFoV writing mode for stitching-free micro-optics Superior quality of optical components without stitching defects can be achieved with Infinite Field-of-View
In January and February of 2023 we will be participating in several premier conferences and exhibitions. Get the preview for
Heidelberg, Germany – We are happy to announce that one hundred and fifty MLA 150 Maskless Aligners have been successfully
From pioneering work to market leadership in maskless laser lithography – The Heidelberg Instruments MLA 150 Maskless Aligner is an