Overview on Maskless Grayscale Lithography
May 30, 2023
From design to micro structured topography: Grayscale lithography can be used to quickly fabricate various 2.5D and 3D structures at the micro scale.
Blog
Grayscale
Ultra-thick positive photoresist layers for maskless grayscale lithography
April 1, 2023
Grayscale lithography can create structured surfaces in photoresist for micro-optics applications. Experiments show promise in fabricating structures over 100 μm using a new experimental resist.
Scalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithography
April 1, 2023
Utilizing grayscale lithography and hard-mask methods, silicon carbide hosts micrometer-scale features and hemispherical solid immersion lenses, boosting optical collection for quantum emitters. Scalable, reproducible, CMOS-compatible.
Grayscale with GenISys 3D-PEC
March 26, 2023
We present the powerful software solution 3D-PEC of GenISys BEAMER for rapid and easy optimization of complex 3D microstructures fabricated with Grayscale laser lithography.
The Lithographer – Quantum Issue
October 26, 2020
The Quantum Issue of The Lithographer, issued Fall 2020 Topics include: Maskless Aligners, Grayscale, 2D Materials, Quantum Technology
Neurite guidance and neuro-caging on steps and grooves in 2.5 dimensions
July 14, 2020
We investigate neurite guidance using semiconductor industry-compatible techniques for fabricating modulated surfaces, enabling the cultivation and study of ordered neuronal networks in a 2.5D configuration.
Large-area, high-numerical-aperture multi-level diffractive lens via inverse design
March 1, 2020
Inverse design enables the creation of thin, high-NA flat lenses. Multi-level diffractive lens (MDL) with a NA=0.9 at 850 nm wavelength, replicable via imprint lithography.
The Lithographer – Grayscale Lithography Issue
January 26, 2020
The Rise of Grayscale Lithography: Direct-write 3D patterning scaled from µm to nm. Grayscale Lithography Issue of The Lithographer, issued January 2020.
Diffractive flat lens enables extreme depth-of-focus imaging
October 11, 2019
Multi-level diffractive lens (MDL) designs drastically enhance depth of focus by over 4 orders of magnitude, enabling focus maintenance for objects separated by large distances.
Imaging over an unlimited bandwidth with a single diffractive surface
July 1, 2019
With the control of the phase in the image plane, a single diffractive surface can correct chromatic aberrations over a wide bandwidth, simplifying imaging systems.
Press Release “LUMINEQ Boosts Transparent Display Innovation with Cutting-Edge MLA 300 Laser Exposure Tool from Heidelberg Instruments” by LUMINEQ dtd. Sept. 11, 2023
September 22, 2023
September 1, 2023, Espoo, Finland – Lumineq Oy, a global leader in transparent display technology, has announced a strategic investment
EIPBN 2023 Conference Review
June 6, 2023
The EIPBN conference, which stands for the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, and is
Congrats to the winners! – Application Image Competition 2022/2023
May 31, 2023
We are thrilled to announce the results of our recent image competition, which showcased the capabilities of our tools in
Discover the benefits of Thermal Scanning Probe Lithography with our NanoFrazor® Webinar
May 3, 2023
Get a sneak peek into current material related research and further prospects. Our webinars on our NanoFrazor® Technology cover a
Redefining Wafer-Level Packaging Production with Heidelberg Instruments Flexible Direct Writing Technology
April 19, 2023
Heidelberg, Germany – Heidelberg Instruments, a global player in direct write technology and solution provider for the advanced packaging market,
t-SPL community gathered for Thermal Probe Workshop
April 18, 2023
Successful 7th Edition of the Thermal Probe Workshop hosted by Heidelberg Instruments Nano After a break of more than three
Stitching-free micro-optics with MPO 100
January 26, 2023
IFoV writing mode for stitching-free micro-optics Superior quality of optical components without stitching defects can be achieved with Infinite Field-of-View
Meet us in person – Upcoming events Jan/Feb 2023
January 18, 2023
In January and February of 2023 we will be participating in several premier conferences and exhibitions. Get the preview for
An unparalleled success story – Our 150th MLA 150 Maskless Aligner installed
December 22, 2022
Heidelberg, Germany – We are happy to announce that one hundred and fifty MLA 150 Maskless Aligners have been successfully
The MLA 150 Success Story
December 21, 2022
From pioneering work to market leadership in maskless laser lithography – The Heidelberg Instruments MLA 150 Maskless Aligner is an