Large Scale Fresnel Zone Plates On SiN-Membranes
This application note describes the fabrication process of Fresnel Zone Plates on a thin silicon nitride membrane substrate for X-ray optics using a DWL 66+.
This application note describes the fabrication process of Fresnel Zone Plates on a thin silicon nitride membrane substrate for X-ray optics using a DWL 66+.
Nanomaterials derive unique properties from their nanostructure. A perspective explores advanced nanofabrication techniques to modify properties in condensed matter systems, discussing applications and future prospects.
Achieve straight, vertical sidewalls in thick negative-tone resist using focused laser beam-based direct write lithography, overcoming non-homogeneous illumination and non-sharp edges. (Possible application: MEMS)
Compare inverse-designed and conventional lenses in MWIR optics. The inverse-designed lens offers better depth-of-focus and off-axis performance but with larger spot size and reduced efficiency.
Grayscale lithography can create structured surfaces in photoresist for micro-optics applications. Experiments show promise in fabricating structures over 100 μm using a new experimental resist.
Utilizing grayscale lithography and hard-mask methods, silicon carbide hosts micrometer-scale features and hemispherical solid immersion lenses, boosting optical collection for quantum emitters. Scalable, reproducible, CMOS-compatible.
Fabrication of a p-GaN gate HEMT with an air-bridge source connection using direct grayscale lithography, achieving good performance with high breakdown voltage and low on-resistance.
We present the powerful software solution 3D-PEC of GenISys BEAMER for rapid and easy optimization of complex 3D microstructures fabricated with Grayscale laser lithography.
Flexible thin film transistors on 50 µm thick polyimide demonstrated stable behavior under simultaneous mechanical and electrical stress up to a 4 mm bending radius.
Versatile system for research and prototyping with variable resolution and wide selection of options.
Exciting news! At Kyoto University Nanotechnology Hub one MPO 100 3D microprinting system and one MLA 150 maskless lithography system
A look back on the 8th Thermal Probe Workshop We were delighted to host a community of nanotechnology experts, fabrication
Achieve high throughput and resolution. Despite its unique capacity for three-dimensional fabrication with minimal feature sizes below 100 nm, achieving
Discover our two Application Notes covering this topic: “Bilayer Lift-Off for NanoFrazor Lithography”“Ultra-High Resolution Pattern Transfer on NanoFrazor Lithography” In
Advancing Excellence in Microfabrication: Fabrication of 2.5D Topographies with Maskless Grayscale Lithography or Two-Photon Polymerization (TPP) What looks like ocean
2024 will mark Heidelberg Instruments‘ 40th anniversary. With gratitude we look back, with joy we look forward to what’s ahead.
Season’s Greetings from Heidelberg Instruments! In the spirit of joy and gratitude, we extend our warmest wishes to our valued
Microneedles as alternative to conventional drug administration Commonly used methods of drug delivery are associated with certain drawbacks: As an
The Heidelberg Instruments booth at SEMICON EUROPA 2023 in Munich from November 14th -17th attracted a wide range of visitors
The EIPBN conference, which stands for the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, and is
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