Large Scale Fresnel Zone Plates On SiN-Membranes
September 27, 2023
This application note describes the fabrication process of Fresnel Zone Plates on a thin silicon nitride membrane substrate for X-ray optics using a DWL 66+.
Blog
DWL 66
Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing
August 1, 2023
Nanomaterials derive unique properties from their nanostructure. A perspective explores advanced nanofabrication techniques to modify properties in condensed matter systems, discussing applications and future prospects.
Vertical sidewalls in thick epoxy resist – a challenge for laser-based direct write lithography
June 11, 2023
Achieve straight, vertical sidewalls in thick negative-tone resist using focused laser beam-based direct write lithography, overcoming non-homogeneous illumination and non-sharp edges. (Possible application: MEMS)
Multilevel diffractive lens in the MWIR with extended depth-of-focus and wide field-of-view
May 1, 2023
Compare inverse-designed and conventional lenses in MWIR optics. The inverse-designed lens offers better depth-of-focus and off-axis performance but with larger spot size and reduced efficiency.
Ultra-thick positive photoresist layers for maskless grayscale lithography
April 1, 2023
Grayscale lithography can create structured surfaces in photoresist for micro-optics applications. Experiments show promise in fabricating structures over 100 μm using a new experimental resist.
Scalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithography
April 1, 2023
Utilizing grayscale lithography and hard-mask methods, silicon carbide hosts micrometer-scale features and hemispherical solid immersion lenses, boosting optical collection for quantum emitters. Scalable, reproducible, CMOS-compatible.
Normally-Off p-GaN Gate High-Electron-Mobility Transistors with the Air-Bridge Source-Connection Fabricated Using the Direct Laser Writing Grayscale Photolithography Technology
April 1, 2023
Fabrication of a p-GaN gate HEMT with an air-bridge source connection using direct grayscale lithography, achieving good performance with high breakdown voltage and low on-resistance.
Grayscale with GenISys 3D-PEC
March 26, 2023
We present the powerful software solution 3D-PEC of GenISys BEAMER for rapid and easy optimization of complex 3D microstructures fabricated with Grayscale laser lithography.
Threshold voltage reliability in flexible amorphous In–Ga–ZnO TFTs under simultaneous electrical and mechanical stress
June 1, 2022
Flexible thin film transistors on 50 µm thick polyimide demonstrated stable behavior under simultaneous mechanical and electrical stress up to a 4 mm bending radius.
DWL 66+ Ultimate Lithography System
April 1, 2022
Versatile system for research and prototyping with variable resolution and wide selection of options.
SEMICON Europa 2023 at a glance
November 20, 2023
The Heidelberg Instruments booth at SEMICON EUROPA 2023 in Munich from November 14th -17th attracted a wide range of visitors
Winners of Application Image Competition receive certificates
October 16, 2023
The EIPBN conference, which stands for the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, and is
Review Expert Workshop on Advanced Micro- and Nanofabrication 2023
October 9, 2023
In what is already a tradition ahead of the MNE International Conference on Micro and Nano Engineering, Heidelberg Instruments and
Press Release “LUMINEQ Boosts Transparent Display Innovation with Cutting-Edge MLA 300 Laser Exposure Tool from Heidelberg Instruments” by LUMINEQ dtd. Sept. 11, 2023
September 22, 2023
September 1, 2023, Espoo, Finland – Lumineq Oy, a global leader in transparent display technology, has announced a strategic investment
EIPBN 2023 Conference Review
June 6, 2023
The EIPBN conference, which stands for the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, and is
Congrats to the winners! – Application Image Competition 2022/2023
May 31, 2023
We are thrilled to announce the results of our recent image competition, which showcased the capabilities of our tools in
Discover the benefits of Thermal Scanning Probe Lithography with our NanoFrazor® Webinar
May 3, 2023
Get a sneak peek into current material related research and further prospects. Our webinars on our NanoFrazor® Technology cover a
Redefining Wafer-Level Packaging Production with Heidelberg Instruments Flexible Direct Writing Technology
April 19, 2023
Heidelberg, Germany – Heidelberg Instruments, a global player in direct write technology and solution provider for the advanced packaging market,
t-SPL community gathered for Thermal Probe Workshop
April 18, 2023
Successful 7th Edition of the Thermal Probe Workshop hosted by Heidelberg Instruments Nano After a break of more than three
Stitching-free micro-optics with MPO 100
January 26, 2023
IFoV writing mode for stitching-free micro-optics Superior quality of optical components without stitching defects can be achieved with Infinite Field-of-View