A scalable nanolithography method enables precise engineering of 2D TMD nanocircuits, like MoS2, for ultra-compact electronic and photonic devices with controlled thickness and excellent conductivity.
Successful performance improvement of an ULTRA i-line laser writer for photonic device mask fabrication, reducing manufacturing costs. Thorough investigation and analysis identify optimal exposure strategies.
Thermal scanning probe lithography (t-SPL) fabricates MoS2-based field-effect transistors, achieving high on/off ratios without damaging materials, offering a gentle alternative to electron beam lithography.
Monodisperse dual-compartment microdevices with pH-sensitive polymer coatings enable tunable, sequential drug release in the gastrointestinal tract, providing a promising strategy for combination therapy.
Purple membranes from Halobacterium salinarum are precisely positioned and oriented in nanofluidic confinement for integration into light-driven nanoscale hybrid devices.
This study analyzes far-field optical mapping of nanostructures using CLSM and radially polarized light, achieving 74 nm resolution for LDOS, crucial for high-density optical storage.
The HIPIN method uses heat-induced ligand transformation to pattern nanomaterials, enabling direct, wavelength-diverse lithography for advanced manufacturing of quantum dot electronic and optoelectronic devices.
Flexible thin film transistors on 50 µm thick polyimide demonstrated stable behavior under simultaneous mechanical and electrical stress up to a 4 mm bending radius.
Thermal scanning probe lithography is a powerful nanofabrication method with 10 nm lateral resolution and 1 nm depth resolution, applicable in biomedicine, nanomagnetism, and nanoelectronics.
Si-based device using a fractal pattern for automatic focusing in high-resolution X-ray tomography. Achieves globally homogeneous visibility and local contrast with versatile X-ray energy applicability.
From us to you – Season’s Greetings! We wish you and your loved ones a joyful time, the space to
Chips Powering the Data Age When the SEMICON Europa 2022 gets underway next month at the Messe München in Munich,
All users of Heidelberg Instruments and Multiphoton Optics products are invited to participate in our new “Application Image Competition on
Upfront the MNE 2022 Eurosensors Conference in Leuven, Belgium from September 19th to 23rd GenISys, Heidelberg Instruments, micro resist technology and Multiphoton Optics jointly
Heidelberg/Würzburg, Germany – The Würzburg based company Multiphoton Optics GmbH will become a branch office of Heidelberg Instruments Mikrotechnik GmbH,
Lithography Systems for Semiconductor Manufacturing The present global shortage in the semiconductor supply chain continues to disrupt many industries, including
Customer satisfaction is our top priority and an important indicator to support customer-oriented development of our systems. For this reason
The commercialization of the NanoFrazor started in 2012. This article looks back at where the NanoFrazor came from, how it
Zurich, Switzerland / Heidelberg, Germany – Heidelberg Instruments Nano AG in Zurich, a subsidiary office of Heidelberg Instruments Mikrotechnik GmbH
Join our expert Dr. Jana Chaaban in this webinar to discover more about the working principle of the NanoFrazor lithography.
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