NanoFrazor
The NanoFrazor takes nanofabrication to the next level. Building on decades of research and development, the NanoFrazor brings thermal scanning probe lithography (t-SPL) into your
The NanoFrazor takes nanofabrication to the next level. Building on decades of research and development, the NanoFrazor brings thermal scanning probe lithography (t-SPL) into your
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules.
Optimised for industrial production with highest throughput and seamless integration into industrial production lines.
Maskless direct imager for high-accuracy and high-resolution microstructures.
Multi-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in micro-optics, photonics, micro-mechanics and biomedical engineering.
A production tool for standard photomasks and microstructures in i-line resists.
Photomask production on large substrates, perfect for display applications.
A tool specifically designed to produce mature semiconductor photomasks.
Versatile system for research and prototyping with variable resolution and wide selection of options.
Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules.
Heidelberg, Germany — Heidelberg Instruments, a world-leading provider of advanced laser lithography systems, is pleased to announce a continued stream
In the world of microfabrication, precision and flexibility are the cornerstones of innovation. Imagine the possibilities when you can access
In today’s world, protecting sensitive information and safeguarding valuable assets is paramount. From government documents and passports to banknotes and
For decades, photolithography with mask aligners has been the cornerstone of microfabrication. But what if there was a faster, more
Organized by our local distributor Stella Technology, the Technical Workshop 2024 for Heidelberg Instruments’ Direct Writing was held on June
Heidelberg Instruments’ Workshop on Maskless Lithography and Direct Write technology in Japan, hosted at The University of Tokyo’s Takeda Building.
Review Technical Workshop on June 11th, 2024 We were thrilled to have Kyoto University host one of our recent technical
The Lurie Nanofabrication Facility (LNF) ordered a Heidelberg Instruments DWL 66+ Maskless Laser Lithography System with CHIPS Act funding through
We are thrilled to announce the results of our recent image competition, which showcased the capabilities of our tools in
Heidelberg Instruments tools, like our Volume Pattern Generator (VPG) series, the Laser Mask Writer ULTRA and the Maskless Aligner MLA
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