MoS₂/WSe₂ moiré superlattices enable coherent, room-temperature telecom light sources integrated with silicon photonics, offering enhanced emission and long coherence for on-chip photonic applications.
Wireless BICEP continuously monitors biomarkers in blood and interstitial fluid, revealing distinct, individualized molecular kinetics and improving personalized health monitoring through integrated dual-compartment biosensing.
Scalable fabrication of twin-boundary-free Cu(111) wafers enables ultraflat 6-inch substrates for high-quality wafer-scale graphene with excellent uniformity, low resistance, and high carrier mobility performance metrics.
Picoeukaryote-based biohybrid microrobots enable active drug delivery in confined environments, demonstrating strong motility, kidney penetration, long-term retention, biosafety, and immune evasion in vivo.
Sb alloying in Mn(Bi,Sb)2Te4 tunes Berry curvature, spin chirality, and harmonic Hall responses, inducing topological transitions and reversible anomalous Hall effects for chiral spin-orbitronic devices.
Leaf-derived lignocellulose scaffolds enable biodegradable, transparent, heat-stable electronic substrates supporting high-performance devices, offering sustainable alternatives to conventional plastics with low cost and minimal carbon footprint.
Organic substrates are hitting a wall. Discover how Heidelberg Instruments’ maskless lithography enables the glass revolution to break the sub-2 µm barrier for AI.
Heidelberg Instruments is excited to announce a follow-up order from a leading Asian manufacturer of display photomasks for its flagship VPG⁺ 1400 FPD Volume Pattern Generator.
Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor at EPFL.
Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system, developed on the established platform of its flagship VPG+ 1400 FPD Volume Pattern Generator.
As AI and HPC push monolithic circuits to obsolescence, the industry turns to Advanced Packaging. Yet, challenges like die shift and substrate warpage threaten to kill yield before the package leaves the fab. Enter the new hero of microelectronics: Maskless Lithography. Learn how adaptive alignment ensures your chiplets live to compute another day.
What a week! From September 15–18, we had the pleasure of joining the micro- and nanofabrication community at the 51st International Micro and Nano Engineering Conference (MNE 2025) in Southampton, UK.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Heidelberg Instruments Korea celebrates 20 years of customer commitment and partnership! Built on trust, loyalty, and long-term relationships, Heidelberg Instruments Korea continues to play a vital role in bringing innovation to local customers.
Join Heidelberg Instruments in Southampton for MNE 2025! We are proud to be sponsor of the prestigious Fellow Award and are looking forward to celebrate the 10th anniversary of our MLA 150 with you.
Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66⁺, solidifying its position as the ultimate research tool for microfabrication.
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Disclaimer: Translations were created with the help of AI. Heidelberg Instruments does not guarantee the correctness of the translations.
