A comprehensive review of maskless photolithography, covering its principles, equipment, photoresponsive materials, applications, development history, and future directions in micro- and nanofabrication.
This work introduces OPTIMISM, enabling universal transfer and integration of metasurfaces in suspended membranes, highlighting inverse-designed ultrathin meta-optics and refractive-index effects for scalable fiber-tip and
How are massive glass substrates patterned with the precision required for next-generation displays? Explore how halftone photomasks create multi-level resist profiles in a single exposure, simplify TFT fabrication, and why large-area mask manufacturing demands exceptional overlay, uniformity, and thermal stability.
Why is Co-Packaged Optics (CPO) gaining momentum now? Explore how optics are moving closer to the chip, why CPO has taken so long to mature, and how advanced lithography could enable scalable manufacturing.
Organic substrates are hitting a wall. Discover how Heidelberg Instruments’ maskless lithography enables the glass revolution to break the sub-2 µm barrier for AI.
Heidelberg Instruments is excited to announce a follow-up order from a leading Asian manufacturer of display photomasks for its flagship VPG⁺ 1400 FPD Volume Pattern Generator.
Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor at EPFL.
Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system, developed on the established platform of its flagship VPG+ 1400 FPD Volume Pattern Generator.
As AI and HPC push monolithic circuits to obsolescence, the industry turns to Advanced Packaging. Yet, challenges like die shift and substrate warpage threaten to kill yield before the package leaves the fab. Enter the new hero of microelectronics: Maskless Lithography. Learn how adaptive alignment ensures your chiplets live to compute another day.
What a week! From September 15–18, we had the pleasure of joining the micro- and nanofabrication community at the 51st International Micro and Nano Engineering Conference (MNE 2025) in Southampton, UK.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Heidelberg Instruments Korea celebrates 20 years of customer commitment and partnership! Built on trust, loyalty, and long-term relationships, Heidelberg Instruments Korea continues to play a vital role in bringing innovation to local customers.
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Disclaimer: Translations were created with the help of AI. Heidelberg Instruments does not guarantee the correctness of the translations.
