This application note describes a low-temperature lithographic process for fabricating high-resolution silicon metalenses, overcoming thermal stress issues and enabling scalable production for mid-IR optics.
Demonstrates single-step 3D patterning of negative resists using maskless aligner, enabling complex microstructures for biomedical, MEMS, and microfluidic applications.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66⁺, solidifying its position as the ultimate research tool for microfabrication.
Poster by Gerda Ekindorf about grayscale exposure challenges using direct-write laser exposure on thick positive resists.
The DWL 66+ enables precise photoresist patterning on KOH-etched silicon sidewalls, achieving superior resolution compared to traditional mask aligners.
Maskless direct imager for high-accuracy and high-resolution microstructures.
High-volume photomask production on large substrates with extremely accurate alignment and fast, high-quality exposures. Perfect for flat panel display (FPD) applications.
Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66+ direct-write lithography system, solidifying its position as the ultimate research tool for microfabrication.
Versatile system for research and prototyping with highest resolution and wide selection of options.
As AI and HPC push monolithic circuits to obsolescence, the industry turns to Advanced Packaging. Yet, challenges like die shift and substrate warpage threaten to kill yield before the package leaves the fab. Enter the new hero of microelectronics: Maskless Lithography. Learn how adaptive alignment ensures your chiplets live to compute another day.
What a week! From September 15–18, we had the pleasure of joining the micro- and nanofabrication community at the 51st International Micro and Nano Engineering Conference (MNE 2025) in Southampton, UK.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Heidelberg Instruments Korea celebrates 20 years of customer commitment and partnership! Built on trust, loyalty, and long-term relationships, Heidelberg Instruments Korea continues to play a vital role in bringing innovation to local customers.
Join Heidelberg Instruments in Southampton for MNE 2025! We are proud to be sponsor of the prestigious Fellow Award and are looking forward to celebrate the 10th anniversary of our MLA 150 with you.
Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66⁺, solidifying its position as the ultimate research tool for microfabrication.
The DWL 66+ is now more powerful than ever, featuring two game-changing enhancements that redefine what’s possible with optical lithography.
Direct Laser Writing accelerates the fabrication of custom infrared metasurfaces—enabling fast, flexible, and cost-effective beam shaping, holography, and more, without complex lithography.
Physicists have crafted the “world’s smallest violin” as a stunning demonstration of their new NanoFrazor nanolithography capabilities.
Read Heidelberg Instruments’ recap of the OPTICA Global Advanced Manufacturing Alliance Meeting 2025. Thanks to all for advancing photonics innovation!
Follow us on social media to benefit
from a range of useful resources.
Disclaimer: Translations were created with the help of AI. Heidelberg Instruments does not guarantee the completeness and correctness of the translations.
