The small- and medium-area volume pattern generators for photomask production in fields such as high-resolution electronic packaging, touch panels, or in general binary templating.
Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor at
Discover how maskless laser lithography enables efficient, high‑resolution, high‑throughput fabrication of Josephson junctions—without relying on electron beam lithography.
Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system.
This application note describes a low-temperature lithographic process for fabricating high-resolution silicon metalenses, overcoming thermal stress issues and enabling scalable production for mid-IR optics.
Demonstrates single-step 3D patterning of negative resists using maskless aligner, enabling complex microstructures for biomedical, MEMS, and microfluidic applications.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Poster by Gerda Ekindorf about grayscale exposure challenges using direct-write laser exposure on thick positive resists.
The DWL 66+ enables precise photoresist patterning on KOH-etched silicon sidewalls, achieving superior resolution compared to traditional mask aligners.
Maskless direct imager for high-accuracy and high-resolution microstructures.
Organic substrates are hitting a wall. Discover how Heidelberg Instruments’ maskless lithography enables the glass revolution to break the sub-2 µm barrier for AI.
Heidelberg Instruments is excited to announce a follow-up order from a leading Asian manufacturer of display photomasks for its flagship VPG⁺ 1400 FPD Volume Pattern Generator.
Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor at EPFL.
Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system, developed on the established platform of its flagship VPG+ 1400 FPD Volume Pattern Generator.
As AI and HPC push monolithic circuits to obsolescence, the industry turns to Advanced Packaging. Yet, challenges like die shift and substrate warpage threaten to kill yield before the package leaves the fab. Enter the new hero of microelectronics: Maskless Lithography. Learn how adaptive alignment ensures your chiplets live to compute another day.
The quantum revolution is shifting from theory to reality, as breakthroughs like Google’s “Quantum Echoes” show. Scaling from small demos to systems with thousands of qubits demands ultra-precise, uniform nanofabrication. This post examines the fabrication challenges and lithographic solutions enabling the leap from lab to large-scale production.
What a week! From September 15–18, we had the pleasure of joining the micro- and nanofabrication community at the 51st International Micro and Nano Engineering Conference (MNE 2025) in Southampton, UK.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Heidelberg Instruments Korea celebrates 20 years of customer commitment and partnership! Built on trust, loyalty, and long-term relationships, Heidelberg Instruments Korea continues to play a vital role in bringing innovation to local customers.
Join Heidelberg Instruments in Southampton for MNE 2025! We are proud to be sponsor of the prestigious Fellow Award and are looking forward to celebrate the 10th anniversary of our MLA 150 with you.
Follow us on social media to benefit
from a range of useful resources.
Disclaimer: Translations were created with the help of AI. Heidelberg Instruments does not guarantee the correctness of the translations.
