High-resolution, damage-free NanoFrazor lithography enables fast and reliable fabrication of Josephson junctions for quantum and nanoelectronics applications.
This application note describes the NanoFrazor’s high-resolution lift-off process for creating sub-100 nm metal features with low line edge roughness using thermal lithography.
The NanoFrazor offers a unique patterning solution, combining t-SPL and laser mix and match lithography.
Thermal scanning probe lithography enabled by NanoFrazor helps to fabricate devices with superior performance due to its damage-free patterning principle.
Chemical conversion using a thermal scanning probe can be used to make biosensors with advanced architecture and tailor surface chemistry to create nanostructures.
The NanoFrazor takes nanofabrication to the next level. Building on decades of research and development, the NanoFrazor brings thermal scanning probe lithography (t-SPL) into your
Explore bilayer lift-off with NanoFrazor lithography, addressing advantages, process details, and examples, including high-quality contacts and structures as small as 7 nm.
High-resolution lithography is crucial for current and future technologies, requiring dimension reduction. NanoFrazor lithography, multi-layer stacks, and alternative strategies for superior patterns are discussed.
Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor at EPFL.
Heidelberg Instruments has received a substantial order from a top-tier photomask manufacturer in Asia for a VPG+ 1850 FPD system, developed on the established platform of its flagship VPG+ 1400 FPD Volume Pattern Generator.
As AI and HPC push monolithic circuits to obsolescence, the industry turns to Advanced Packaging. Yet, challenges like die shift and substrate warpage threaten to kill yield before the package leaves the fab. Enter the new hero of microelectronics: Maskless Lithography. Learn how adaptive alignment ensures your chiplets live to compute another day.
The quantum revolution is shifting from theory to reality, as breakthroughs like Google’s “Quantum Echoes” show. Scaling from small demos to systems with thousands of qubits demands ultra-precise, uniform nanofabrication. This post examines the fabrication challenges and lithographic solutions enabling the leap from lab to large-scale production.
What a week! From September 15–18, we had the pleasure of joining the micro- and nanofabrication community at the 51st International Micro and Nano Engineering Conference (MNE 2025) in Southampton, UK.
Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world.
Heidelberg Instruments Korea celebrates 20 years of customer commitment and partnership! Built on trust, loyalty, and long-term relationships, Heidelberg Instruments Korea continues to play a vital role in bringing innovation to local customers.
Join Heidelberg Instruments in Southampton for MNE 2025! We are proud to be sponsor of the prestigious Fellow Award and are looking forward to celebrate the 10th anniversary of our MLA 150 with you.
Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66⁺, solidifying its position as the ultimate research tool for microfabrication.
The DWL 66+ is now more powerful than ever, featuring two game-changing enhancements that redefine what’s possible with optical lithography.
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