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GenISys GmbH

Grayscale with GenISys 3D-PEC

We present the powerful software solution 3D-PEC of GenISys BEAMER for rapid and easy optimization of complex 3D microstructures fabricated with Grayscale laser lithography.

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Maskless lithography provides the extreme overlay accuracy which is central to applications in the sensor field: The production of SQUID devices may involve as many as 18 layers and high-resolution features. The alignment between layers is crucial to the production yield and is completed automatically with the Maskless Aligner technology (impressively demonstrated here by the MLA 150).

Beyond Theory: Engineering Quantum Devices with Precision Lithography

The quantum revolution is shifting from theory to reality, as breakthroughs like Google’s “Quantum Echoes” show. Scaling from small demos to systems with thousands of qubits demands ultra-precise, uniform nanofabrication. This post examines the fabrication challenges and lithographic solutions enabling the leap from lab to large-scale production.

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