Lithography Technologies for Micro- and Nanofabrication
Heidelberg Instruments develops advanced lithography technologies for microfabrication and nanofabrication, enabling precise patterning from the microscale down to the nanoscale. Our portfolio combines Maskless Laser Lithography for flexible direct-write patterning with Thermal Scanning Probe Lithography (t-SPL) for ultra-high-resolution nanolithography.
Maskless laser lithography enables rapid prototyping, accurate pattern placement, and grayscale lithography without the need for photomasks. This makes it ideal for the fabrication of complex 2D and 2.5D microstructures, micro-optics, MEMS, and advanced research devices.
Complementing this approach, the NanoFrazor platform based on thermal scanning probe lithography enables non-invasive nanopatterning with sub-10-nanometer precision, combining direct-write nanolithography with in-situ inspection and metrology on the same tool.
Together, these technologies support the fabrication of high-resolution micro- and nanostructures, including complex topographies, high-aspect-ratio features, and structures on small or unconventional substrates, enabling innovation in photonics, micro-optics, nanotechnology, and advanced materials research.
