Heidelberg/Würzburg, January 18, 2022. “1 – 10 – 100 – 1000” – Achievable component heights of over 1 cm, surfaces with roughness in the order of 10 nm, structure sizes of less than 100 nm, and writing speeds over 1000 mm/s: At the SPIE Photonics West in San Francisco, from January 25th to 27th, Heidelberg
Heidelberg Instruments receives ISO 9001:2015 Certificate for extraordinary Quality Management Heidelberg, September 22, 2021. TÜV Süd, an auditor and provider of safety, security and sustainability solutions, has awarded ISO 9001:2015 certification to Heidelberg Instruments, an international vendor of Laser Lithography Systems. This emphasizes the vendor’s high quality standards. Heidelberg Instruments’ own management team also used
Heidelberg, Germany, 26 August 2021: Heidelberg Instruments announced order for an ULTRA Semiconductor Laser Mask Writer from a large photomask production group in China. ULTRA Semiconductor Laser Mask Writer is the industry’s most economical solution for the production of photomasks with a 180 nm design node. With its high throughput, small minimum feature size, excellent
Heidelberg, June 9, 2021 – Heidelberg Instruments, a leading laser lithography and nanofabrication equipment manufacturer, today announced the biggest single order in its history. This purchase, by a key photomask production group in Asia, includes two systems: a VPG+ 1400 for producing display photomasks and an ULTRA200 for semiconductor photomask applications. The order is valued
Heidelberg/Würzburg, March 30, 2021 – Multiphoton Optics GmbH has become a wholly owned subsidiary of Heidelberg Instruments Mikrotechnik GmbH. The pooling of development capabilities and technologies for producing microstructures further underscores the global importance of research, development and production of direct-writing laser systems “Made in Germany”. The merger also extends the company’s market position in the micro-optics
Heidelberg/Würzburg, January 18, 2022. “1 – 10 – 100 – 1000” – Achievable component heights of over 1 cm, surfaces
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