Moore’s law has pushed the specifications of today’s transistors to a level that is often beyond reach for conventional direct-write nanolithography. The high throughput manufacturing technologies, such as EUV or DUV multi-patterning systems, are too expensive for the efficient exploration of promising new materials and designs necessary for next-generation chips – especially for the “Beyond Moore” devices. Alternative rapid prototyping methods are required and sought after for the development of such novel nano-electronic devices.