Nanoelectronics

Rapid Prototyping of Nanoelectronic Devices

Description
Ever-higher speeds, new functionalities, and device structures are made possible by shrinking electronic devices further and by integrating novel materials in active regions. The exploration of device architectures and fabrication on new materials requires a rapid prototyping approach, where design changes can be tested and implemented efficiently. Research and development for next-generation chips, especially the “Beyond Moore” devices, requires lithography solutions for the nanoscale for a variety of laboratory and pilot line settings.

The NanoFrazor® enables nanoelectronics through Thermal Scanning Probe Lithography (t-SPL) combined with Direct Laser Sublimation. Through thermal nanolithography, nanostructures in the most critical regions of devices can be created at the highest resolutions. The integration with laser direct sublimation of the same thermal resists enables efficient writing of electrical traces and contacts. The combination makes the NanoFrazor® particularly suitable for nanoelectronic device fabrication for applications such as quantum electronics and molecular sensing.
Requirements
Dense patterns with high resolution features and low line edge roughness

Precise overlay of several layers

Compatibility with existing pattern transfer processes

Fast turnaround time with high flexibility
Benefits
Ultra-high resolution

Possible without the need for proximity effect corrections

In-situ imaging

Immediate feedback and quality control of the nano-patterns

No charge accumulation

Critical insulating layers are not impacted by charged particles

Accurate overlay

No artificial markers or expensive positioning systems required

Ever-higher speeds, new functionalities, and device structures are made possible by shrinking electronic devices further and by integrating novel materials in active regions. The exploration of device architectures and fabrication on new materials requires a rapid prototyping approach, where design changes can be tested and implemented efficiently. Research and development for next-generation chips, especially the “Beyond Moore” devices, requires lithography solutions for the nanoscale for a variety of laboratory and pilot line settings.

The NanoFrazor® enables nanoelectronics through Thermal Scanning Probe Lithography (t-SPL) combined with Direct Laser Sublimation. Through thermal nanolithography, nanostructures in the most critical regions of devices can be created at the highest resolutions. The integration with laser direct sublimation of the same thermal resists enables efficient writing of electrical traces and contacts. The combination makes the NanoFrazor® particularly suitable for nanoelectronic device fabrication for applications such as quantum electronics and molecular sensing.