Nanoelectronics
Rapid Prototyping of Nanoelectronic Devices
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Description
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Ever-higher speeds, new functionalities, and device structures are made possible by shrinking electronic devices further and by integrating novel materials in active regions. The exploration of device architectures and fabrication on new materials requires a rapid prototyping approach, where design changes can be tested and implemented efficiently. Research and development for next-generation chips, especially the “Beyond Moore” devices, requires lithography solutions for the nanoscale for a variety of laboratory and pilot line settings.
The NanoFrazor® enables nanoelectronics through Thermal Scanning Probe Lithography (t-SPL) combined with Direct Laser Sublimation. Through thermal nanolithography, nanostructures in the most critical regions of devices can be created at the highest resolutions. The integration with laser direct sublimation of the same thermal resists enables efficient writing of electrical traces and contacts. The combination makes the NanoFrazor® particularly suitable for nanoelectronic device fabrication for applications such as quantum electronics and molecular sensing.
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Requirements
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Dense patterns with high resolution features and low line edge roughness
Precise overlay of several layers
Compatibility with existing pattern transfer processes
Fast turnaround time with high flexibility
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Solutions
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Ultra-high resolution
Possible without the need for proximity effect correctionsIn-situ imaging
Immediate feedback and quality control of the nano-patternsNo charge accumulation
Critical insulating layers are not impacted by charged particlesAccurate overlay
No artificial markers or expensive positioning systems required
Ever-higher speeds, new functionalities, and device structures are made possible by shrinking electronic devices further and by integrating novel materials in active regions. The exploration of device architectures and fabrication on new materials requires a rapid prototyping approach, where design changes can be tested and implemented efficiently. Research and development for next-generation chips, especially the “Beyond Moore” devices, requires lithography solutions for the nanoscale for a variety of laboratory and pilot line settings.
The NanoFrazor® enables nanoelectronics through Thermal Scanning Probe Lithography (t-SPL) combined with Direct Laser Sublimation. Through thermal nanolithography, nanostructures in the most critical regions of devices can be created at the highest resolutions. The integration with laser direct sublimation of the same thermal resists enables efficient writing of electrical traces and contacts. The combination makes the NanoFrazor® particularly suitable for nanoelectronic device fabrication for applications such as quantum electronics and molecular sensing.
Dense patterns with high resolution features and low line edge roughness
Precise overlay of several layers
Compatibility with existing pattern transfer processes
Fast turnaround time with high flexibility
Ultra-high resolution
In-situ imaging
No charge accumulation
Accurate overlay
Application images
suitable Systems
NanoFrazor® Explore
- Thermal Scanning Probe Lithography System
Thermal scanning probe lithography tool with direct laser sublimation and grayscale modules. Excellent alternative to e-beam lithography tools.