Nanoelectronics
Rapid Prototyping of Nanoelectronic Devices
Moore’s law has pushed the specifications of today’s transistors to a level that is often beyond reach for conventional direct-write nanolithography. The high throughput manufacturing technologies, such as EUV or DUV multi-patterning systems, are too expensive for the efficient exploration of promising new materials and designs necessary for next-generation chips – especially for the “Beyond Moore” devices. Alternative rapid prototyping methods are required and sought after for the development of such novel nano-electronic devices.
Dense patterns with high resolution features and low line edge roughness
Precise overlay of several layers
Compatibility with existing pattern transfer processes
Fast turnaround time with high flexibility
Ultra-high resolution
Possible without the need for proximity effect corrections
In-situ imaging
Immediate feedback and quality control of the nano-patterns
No charge accumulation
Critical insulating layers are not impacted by charged particles
Accurate overlay
No artificial markers or expensive positioning systems required
Application images
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suitable Systems
NanoFrazor® Explore
- Thermal Scanning Probe Lithography System
Thermal scanning probe lithography tool with a direct laser sublimation and grayscale modules, excellent alternative to e-beam lithography tools.