Reflectors, Diffusors and Micro-Lenses Crafted in Excellence

Micro-lens arrays and complex Fresnel lenses have become a key element of any compact camera optics, and the evolution of smartphones and tablets is driving the demand for ever more advanced and miniaturized optics. In addition, micro-lenses are used in wave-front sensors, for fiber coupling, or for homogenizing light sources.
Grayscale lithography is essential for the creation of such state-of-the-art technologies: With it, the molds are generated. Those then are replicated by LIGA to create a metal shim, which in turn is used as a master tool to create replications by molding, imprinting or hot embossing.
Aside from lenses, Grayscale Lithography is utilized to fabricate a multitude of other micro-optical components. Examples are micro prisms, waveguides, blazed gratings or micro-mirrors. In addition, Computer Generated Holograms (CGH) and special security labels are other applications where Grayscale Lithography excels.
Due to the strict requirements in the fabrication of diffraction gratings, standard methods like interference lithography are often not applicable. Direct Write Lithography on the other hand allows fast and precise manufacturing of VLS and standard gratings.
Our DWL series includes a variety of high-performance Grayscale systems: The DWL 66+ represents the ideal Research & Development tool, offering all levels of Grayscale Lithography and a multitude of options. The top-end DWL series (2000 and 4000) comes equipped with air-bearing stage, professional Grayscale package, and high accuracy features as standard.

Very precise shape control

Excellent surface roughness

High throughput also for very deep applications

No stitching effect

High resolution

Flexible substrate sizes for different applications

Diffraction gratings: Strict requirements for surface quality, groove position, and groove profile

Resolution down to 300 nm

Stitching reduction functions

Substrates from small spieces to G8 panel sizes

Shape optimization software

High precision stage system for accurate pattern placement

Application specific writemode to optimize resolution and throughput

High power diode laser

Application images


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