Application Note: Ultra-High Resolution Pattern Transfer

High-resolution lithography has played a central role in the nanotechnology revolution of the past decade. While ultra-high resolution lithography (<50 nm) is the focus of many research and industrial efforts, pattern transfer – the subsequent step to lithography – presents many challenges of its own.

This application note shows how we can combine the capabilities of the NanoFrazor lithography with especially customized etching and lift-off methods for the successful transfer of ultra-high resolution patterns.

Read this application note in our

To access this document type in “pattern transfer” into the search bar or filter for the category “Application Note” and for the tag “NanoFrazor”


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