Showcase your work
The Application Image Gallery showcases impressive micro- and nanostructures created with Heidelberg Instruments systems. Researchers from around the world can contribute their images, showing the capabilities of our tools in advanced research for various applications.
We want to highlight the remarkable innovations taking place in fields such as nanotechnology, biomedical engineering, quantum devices, flexible electronics, photonics, and more.
Selected submissions are featured across our marketing channels to celebrate the creativity and achievements of our users and to inspire the global micro- and nanofabrication community. We also aim to support the work beyond the promotion and will try to find helpful measures together.
Submission Guidelines
- Upload 1 to 5 images and/or a short video (< 3min) illustrating an innovative application.
- The depicted structures must be created with any current or past Heidelberg Instruments system.
- The images must be free of third-party copyright.
- The images can be made with any equipment (e.g., cameras or microscopes).
- The images can be slightly edited when it serves an illustrative purpose (e.g., scale bar or naming of elements).
- Heidelberg Instruments will have the right to use the images online or in printed form. They will be associated with a reference chosen by the submitter (author’s name and/or institution).
- Multiple entries regarding different applications should be made separately.
We would welcome high-resolution images that help to understand the application with a clear and concise description, including structure dimensions, the fabrication process, and specifications of the substrates used. Take a look at the gallery below to get some inspiration.
After submitting the entry form, you will receive an email with further instructions on how to upload your images. Once all required materials have been submitted, we will contact you shortly.
Thank you for your submission!
Silicon Metalens with Subwavelength Resolution for High-Performance Flat Optics by Nurten Koc (DWL 66+)
Top-view SEM image of a metalens with a diameter of 200 μm. While the nanoblocks are identical in shape and size, their rotation and orientation vary relative to each other, underscoring the design flexibility inherent in the metalens architecture.
Silicon Metalens with Subwavelength Resolution for High-Performance Flat Optics by Nurten Koc (DWL 66+)
60° tilted-view SEM image of a metalens with a diameter of 200 μm. While the nanoblocks are identical in shape and size, their rotation and orientation vary relative to each other, underscoring the design flexibility inherent in the metalens architecture.
Fabrication of Single-Crystal Suspended Sub-300 nm Si Nanowires (Si NWs) for High-Performance Next-Generation Sensors by Basit Ali (DWL 66+)
An array of Si nanowires, with same in-plane critical dimension, fabricated on Si substrate. Three different lengths ( 5, 10, 15 micrometer) are patterned, demonstrating the patterning of high aspect ratio nanowires.
Fabrication of Single-Crystal Suspended Sub-300 nm Si Nanowires (Si NWs) for High-Performance Next-Generation Sensors by Basit Ali (DWL 66+)
A close-up of Silicon nanowire with an in-plane critical dimension of 250 nm and thickness of 150 nm, bridging 5000 nm-thick MEMS on its extremities. Both nanowire and MEMS anchors are fabricated monolithically.
Fabrication of Single-Crystal Suspended Sub-300 nm Si Nanowires (Si NWs) for High-Performance Next-Generation Sensors by Basit Ali (DWL 66+)
Si nanowire array with different critical dimension, fabricated on Si substrate. The minimum available in-plane CD of 250 nm, with order of magnitude greater nanowire length demonstrate the patterning of high aspect ratio 1D Si nanowire.
Single-Cell Microfluidic Trapping System to Study Single Immune T-Cell Dynamics by Wei-Che Chang (MLA 150)
Overview of the multiplex single-cell trap on the silicon wafer. Microscopic picture of a cell array with 200 single-cell traps.
Single-Cell Microfluidic Trapping System to Study Single Immune T-Cell Dynamics by Wei-Che Chang (MLA 150)
Close up image of the multiplex single-cell trap on the silicon wafer. The trap is fabricated by the Dual-Exposure Lithography (DEL) approach.
Single-Cell Microfluidic Trapping System to Study Single Immune T-Cell Dynamics by Wei-Che Chang (MLA 150)
Microscopic picture of a single Jurkat cell captured in the PDMS fabricated microfluidic chip. Cells in this experiment were labeled with CellTrackerTM Green CMFDA Dye. The Image was acquired by confocal microscopy.
Grayscale Direct-Write Laser Annealing of Magnetic Thin Films by Lauren Riddiford (DWL 66+)
Grayscale design used as input for the exposure.
Grayscale Direct-Write Laser Annealing of Magnetic Thin Films by Lauren Riddiford (DWL 66+)
Output of the design after exposure on a magnetic film. The light regions have magnetization pointing out-of-plane, while the dark regions have no out-of-plane magnetization component.
GaN Devices: Fabricated Array of Gold Air Bridges by Shonkho Shuvro (µPG501)
Electroplated gold air bridges on Si fabricated after a dual lithography process involving resist reflow.
GaN Devices: Fabricated Array of Gold Air Bridges by Shonkho Shuvro (µPG501)
Electroplated gold air bridges on Si fabricated after a dual lithography process involving resist reflow.
Grayscale Nanotopographies Combining t-SPL and Nanoimprint for 2D Nanoelectronics by Berke Erbas & Xia Liu (NanoFrazor)
A CVD-grown MoS₂ monolayer on grayscale-patterned SiO₂ was structured into 2D FET channels, with source and drain electrodes added by lift-off metallization.
Grayscale Nanotopographies Combining t-SPL and Nanoimprint for 2D Nanoelectronics by Berke Erbas & Xia Liu (NanoFrazor)
High-precision sinusoidal SiO₂ nanopatterns (400 nm pitch, 100–150 nm depth) were amplified from polymers, maintaining smooth surfaces for nanoimprint or 2D material straining applications.
Grayscale Nanotopographies Combining t-SPL and Nanoimprint for 2D Nanoelectronics by Berke Erbas & Xia Liu (NanoFrazor)
An exfoliated monolayer of MoS₂ is transferred onto an engineered gate oxide with sinusoidal waves modulated in two-dimensions, inducing strain in the atomically thin material.
A Microfluidic Device for Synthetic Biology created from a SU-8 Mold by Kei Ikemori & Prof. Yuichi Wakamoto (µMLA)
Microchambers fabricated in PDMS using an SU-8 mould from a µMLA hosted fluorescent E. coli with synthetic gene circuits. Cooperative fluorescence formed a wave pattern around the Heidelberg Instruments logo.
Optical Gratings on Atom Chips to Extend Microtechnological Functions for Creating an Integrated Quantum Laboratory by Sascha de Wall (DWL 66+)
For compact Bose-Einstein condensate systems, a nanostructured optical grating - patterned with a DWL 66+, etched into Si, and coated with Al - creates a grating magneto-optical trap that simplifies atom cooling setups.
Fabricating Semiconductor MoS2 Nano-Circuits by Giorgio Zambito (NanoFrazor)
MoS₂ nano-circuit in the shape of the DIFILab logo, fabricated with a NanoFrazor Scholar. Conductive AFM mapping shows well-defined nanoscale conductivity, highlighting the potential of 2D TMDs for nanoelectronics.
