Lately, a Nature article inspired us to take a look at our MLA Maskless Aligner series. The authors described a low-cost approach to DNA data storage, using photolithographic synthesis*. In principle, when using DNA data storage, information is stored by encoding binary data into the four nucleic bases of DNA. To access it, DNA is
Mark your calendars! The Heidelberg Instruments short webinar series starts on Thursday, July 29th. Full details on all of the webinars can be found below. We are looking forward to welcoming you at our webinar series. Thursday, July 29th, 8am CESTULTRA Laser WriterThis webinar will give a technical introduction of the Heidelberg Instruments Ultra Laser
On behalf of our partners Raith, Nanoscribe, GenISys and micro resist technology and our entire organization team, we’d like to thank all participants for attending Nano-Micro-Lithography Symposium (NMLS) and making it a great event! One week ago today we launched NMLS for the second time as an online event, this time on gather.town. The platform
Join us for the 3rd Nano-Micro-Lithography Symposium, hosted on gather.town. This online event brings together technical experts, customers and users
We celebrate the National Nanotechnology Day (USA) on October 9th, which pays homage to the nanometer scale: 1 nm equals
Nano Frazor Explore installation at Queen Mary University of London (Photo by Jonas Vergés) Two more NanoFrazor systems were installed
Thermal scanning probe lithography (t-SPL), enabled by NanoFrazor, uses a heatable ultrasharp tip for simultaneous patterning and inspection of nanostructures
Heidelberg Instruments receives ISO 9001:2015 Certificate for extraordinary Quality Management Heidelberg, September 22, 2021. TÜV Süd, an auditor and provider
The oldest light in the Universe is called Cosmic Microwave Background (CMB), or relic radiation. It began travelling through space
The Micro and Nano Engineering (MNE) conference is the flagship event of the international Micro and Nano Engineering society (iMNEs)
Traditions of the past transformed into efficient production Conventional optical lithography requires the use of a mask aligner to fabricate
Heidelberg, Germany, 26 August 2021: Heidelberg Instruments announced order for an ULTRA Semiconductor Laser Mask Writer from a large photomask
We’re happy to announce the first NanoFrazor Explore system in Latin America installed at UNICAMP, Campinas (Brazil) in the Center
